Conference
Uniformity and dosimetry study of the 30 kV Danfysik decel lens system
Abstract
In this paper we report on the uniformity and the dosimetry achieved using a decel system designed by Danfysik and fitted to their high current DF1090 research implanter housed within the Surrey facility Energy contamination caused by charge exchange within the lens is addressed as is the effect of different accel-decel ratios on the implant uniformity in the energy range 1-10 keV. Uniformity measurements using optical techniques made on …
Authors
Gwilliam R; Nejim A; Knights A; Sealy B
Volume
1
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
January 1, 1998
DOI
10.1109/iit.1999.812132
Name of conference
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144)