Conference
SiOx, SiNx, SiNxOy deposited by ICP-CVD system with optimized uniformity for optical coatings
Abstract
A newly designed ICP-CVD system with in-situ spectroscopic ellipsometry has been constructed and calibrated for the deposition of high quality thin films optimized for optical coatings and other applications. © 2007 Optical Society of America.
Authors
Tan X; Wojcik J; Zhang H; Mascher P
Publication Date
January 1, 2007
ISBN-10
1557528411
ISBN-13
9781557528414
Conference proceedings
Optics InfoBase Conference Papers