Comparison of SiOxNy thin films deposited by ECR-PECVD at 2.4 and 3.0 mTorr total pressure Conferences

Overview
Identity
Additional Document Info
View All

authors

status

published

publication date

August 29, 2017

published in

Proceedings of SPIE - The International Society for Optical Engineering Journal

presented at event

Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging Conference