Conference
Comparison of SiOxNy thin films deposited by ECR-PECVD at 2.4 and 3.0 mTorr total pressure
Authors
Wojcik J
Publisher
SPIE, the international society for optics and photonics
Publication Date
August 29, 2017
DOI
10.1117/12.2283971
Name of conference
Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging