Boron Diffusion in Si, SiGe, and SiGeC

We have used the process simulator ISE-FLOOPS to implement a model describing the diffusion behaviors of boron and carbon in silicon and silicon germanium. The model has been tested against a wide range of sample structures and experimental conditions in published work, and proven to successfully simulate all common phenomena involving boron and carbon in SiGe systems. In particular, we consider the reduction of transient enhanced diffusion of boron due to localized carbon concentrations in SiGeC. The model takes into account carbon diffusion according to both the kickout and Frank-Turnbull mechanisms for diffusion, the effect of boron-interstitial clusters, {311} defects, and interstitial capture by substitutional carbon.