A comprehensive kinetic model for wet oxidation of silicon germanium alloys

We propose a complete model for the oxidation of silicon-germanium. Our model is capable of predicting, as a function of time, the oxide thickness, the profile of the silicon in the underlying alloy, and the profile of germanium in the oxide. The parameters of the model vary with temperature, alloy composition and oxidizing ambient. The model shows excellent agreement with published results, with the model parameters following trends consistent with the physical phenomena hypothesized.