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Study of PECVD silicon nitride and silicon oxide gate dielectrics for organic thin-film transistor circuit integration
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Overview
authors
Li, FM
Wu, Yiliang
Ong, BS
Vygranenko, Y
Nathan, A
status
published
publication date
December 1, 2007
published in
Materials Research Society Symposium - Proceedings
Journal
Additional Document Info
start page
124
end page
129
volume
1003