SALVO process for sub-50 nm low-V/sub T/ replacement gate CMOS with KrF lithography Conferences uri icon

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authors

  • Chang, C-P
  • Vuang, H-H
  • Baker, MR
  • Pai, CS
  • Klemens, FP
  • Miner, JF
  • Mansfield, WM
  • Kleiman, Rafael
  • Kornbllit, A
  • Baumann, FH
  • Rogers, SN
  • Bude, M
  • Grazul, JL
  • Lloyd, EJ
  • Frei, M
  • Sorsch, TW
  • Cirelli, R
  • Ferry, E
  • Bolan, K
  • Barr, D
  • Lee, JT-C

publication date

  • December 1, 2000