Principles of optical design of the SM beamline at the CLS

The spectromicroscopy beamline (SM) at the Canadian Light Source (CLS) will provide 100 – 2000 eV photons in a high brightness, high flux, medium resolution and small spot size beam. The beamline consists of an advanced elliptically polarized undulator (EPU) source and a novel entrance slit‐less plane grating monochromator which feeds two branch lines, one optimized for scanning transmission X‐ray microscopy (STXM), the other for X‐ray photoemission electron microscopy (X‐PEEM). This article outlines the beamline design strategy, and discusses the design optimization relative to the requirements for state‐of‐the‐art STXM and X‐PEEM.