Experts has a new look! Let us know what you think of the updates.

Provide feedback
Home
Scholarly Works
Shallow Extension Engineered Dual Material...
Journal article

Shallow Extension Engineered Dual Material Surrounding Gate (SEE-DM-SG) MOSFET for improved gate leakages, analysis of circuit and noise performance

Abstract

The leakages in off state, particularly Gate Induced Drain Leakage (GIDL) has been addressed and reduced by proposing a Shallow Extension Engineered Dual Material Surrounding Gate (SEE-DM-SG) MOSFET. The shallow extensions create an insulating layer, which acts as a diffusion stopper and thereby suppresses the off state leakages. It is done by comparing the off-state performance of SEE-DM-SG MOSFET with Dual Metal Surrounding Gate (DM-SG) …

Authors

Goel A; Rewari S; Verma S; Gupta RS

Journal

AEU - International Journal of Electronics and Communications, Vol. 111, ,

Publisher

Elsevier

Publication Date

November 2019

DOI

10.1016/j.aeue.2019.152924

ISSN

1434-8411