Single etch grating couplers for mass fabrication with DUV lithography

Surface grating couplers enable efficient coupling of light between optical fibers and planar waveguide circuits. While traditional grating designs require two etch steps for efficient coupling to silicon-on-insulator waveguides, recently proposed subwavelength structured gratings can achieve the same coupling efficiencies with a single etch step, thereby significantly reducing fabrication complexity. Here we demonstrate that such couplers can be fabricated on a large scale with ultra-violet lithography, achieving a 5 dB coupling efficiency at 1,550 nm. Through both simulations and experiments we give physical insight on how pattern fidelity impacts the performance of these couplers, and propose strategies to deal with inevitable process variations.