Enhanced performance of integrated silicon nanophotonic devices engineered by sub-wavelength grating structures

Sub-wavelength gratings, segmented resonant-less structures with geometries featuring scales considerably smaller than the wavelength of light, have enabled an attractive technological concept to locally control light guiding properties in planar silicon chip architectures. This concept has allowed for additional degrees of freedom to tailor effective mode index, modal confinement, waveguide dispersion, as well as anisotropy, thereby providing a vital route towards high performing devices with engineered optical properties. Sub-wavelength integrated nanophotonics has opened up new horizons for realization of key building components that afford outstanding device performances, typically beyond those achieved by conventional design strategies, yet favorably benefiting from the sub-100-nm pattern resolution of established semiconductor manufacturing tools in nanophotonic foundries. The distinctive features of sub-wavelength grating structures are considered essential for future generation of chip-scale applications in optical communications and interconnects, biomedicine, as well as quantum-based technologies. In this work, we report recent advances in the development of high-performance on-chip nanophotonic waveguides and devices engineered with the sub-wavelength grating metamaterial structures. In particular, we discuss recent achievements of low-loss waveguides with controlled chromatic dispersion, high-efficiency fiber-to-chip surface grating couplers, micro-ring resonators, and grating-assisted waveguide filters, implemented on the mature silicon-on-insulator technology.