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Orthodox etching of HVPE-grown GaN
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Orthodox etching of HVPE-grown GaN

Abstract

Orthodox etching of HVPE-grown GaN in molten eutectic of KOH+NaOH (E etch) and in hot sulfuric and phosphoric acids (HH etch) is discussed in detail. Three size grades of pits are formed by the preferential E etching at the outcrops of threading dislocations on the Ga-polar surface of GaN. Using transmission electron microscopy (TEM) as the calibration tool, it is shown that the largest pits are formed on screw, intermediate on mixed and the …

Authors

Weyher JL; Lazar S; Macht L; Liliental-Weber Z; Molnar RJ; Müller S; Sivel VGM; Nowak G; Grzegory I

Volume

305

Pagination

pp. 384-392

Publisher

Elsevier

Publication Date

7 2007

DOI

10.1016/j.jcrysgro.2007.03.030

Conference proceedings

Journal of Crystal Growth

Issue

2

ISSN

0022-0248