Conference
Orthodox etching of HVPE-grown GaN
Abstract
Orthodox etching of HVPE-grown GaN in molten eutectic of KOH+NaOH (E etch) and in hot sulfuric and phosphoric acids (HH etch) is discussed in detail. Three size grades of pits are formed by the preferential E etching at the outcrops of threading dislocations on the Ga-polar surface of GaN. Using transmission electron microscopy (TEM) as the calibration tool, it is shown that the largest pits are formed on screw, intermediate on mixed and the …
Authors
Weyher JL; Lazar S; Macht L; Liliental-Weber Z; Molnar RJ; Müller S; Sivel VGM; Nowak G; Grzegory I
Volume
305
Pagination
pp. 384-392
Publisher
Elsevier
Publication Date
7 2007
DOI
10.1016/j.jcrysgro.2007.03.030
Conference proceedings
Journal of Crystal Growth
Issue
2
ISSN
0022-0248