Plasmon-Induced Heterointerface Thinning for Schottky Barrier Modification of Core/Shell SiC/SiO2 Nanowires
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In this work, plasmon-induced heterointerface thinning for Schottky barrier modification of core/shell SiC/SiO2 nanowires is conducted by femtosecond (fs) laser irradiation. The incident energy of polarized fs laser (50 fs, 800 nm) is confined in the SiO2 shell of the nanowire due to strong plasmonic localization in the region of the electrode-nanowire junction. With intense nonlinear absorption in SiO2, the thickness of the SiO2 layer can be thinned in a controllable way. The tuning of the SiO2 barrier layer allows the promotion of electron transportation at the electrode-nanowire interface. The switching voltage of the rectifying junction made by the SiC/SiO2 nanowire can be significantly tuned from 15.7 to 1 V. When selectively thinning at source and drain electrodes and leaving the SiO2 barrier layer at the gate electrode intact, a metal/oxide/semiconductor (MOS) device is fabricated with low leakage current. This optically controlled interfacial engineering technology should be applicable for MOS components and other heterogeneous integration structures.
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