authors
- Landesman, Jean-Pierre
- Cassidy, Daniel Thomas
- Fouchier, Marc
- Pargon, Erwine
- Levallois, Christophe
- Mokhtari, Merwan
- Jimenez, Juan
- Torres, Alfredo
Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
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Overview
status
publication date
- September 2018
has subject area
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics (FoR)
- 0906 Electrical and Electronic Engineering (FoR)
- 1099 Other Technology (FoR)
- Applied Physics (Science Metrix)
published in
- Journal of Electronic Materials Journal