Journal article
Design of Deeply Etched Antireflective Waveguide Terminators
Abstract
An alternative solution to achieve an antireflective waveguide terminator is proposed by adopting a deeply etched waveguide structure to replace the conventional facet interference coatings. The performance is evaluated by different numerical approaches and optimum designs can be achieved based on the combination of the finite-difference time-domain method and the transfer matrix method. Perfectly matched layer absorbing boundary conditions are …
Authors
Zhou G-R; Li X; Feng N-N
Journal
IEEE Journal of Quantum Electronics, Vol. 39, No. 2,
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
February 2003
DOI
10.1109/jqe.2002.807185
ISSN
0018-9197