Conference
Fabrication of fused silica phase masks by reactive ion etching
Authors
Chen G; Jian S; Yang L; Li X; Cheng M; Zhu Y; Li L; Ge H; Wang W
Volume
2885
Pagination
pp. 164-168
Publisher
SPIE, the international society for optics and photonics
Publication Date
September 23, 1996
DOI
10.1117/12.251861
Name of conference
Holographic Optical Elements and Displays
Conference proceedings
Proceedings of SPIE--the International Society for Optical Engineering
ISSN
0277-786X