Low leakage, ultra-thin gate oxides for extremely high performance sub-100 nm nMOSFETs Conference Paper uri icon

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authors

  • Timp, G
  • Agarwal, A
  • Baumann, FH
  • Boone, T
  • Buonanno, M
  • Cirelli, R
  • Donnelly, V
  • Foad, M
  • Grant, D
  • Green, M
  • Gossmann, H
  • Hillenius, S
  • Jackson, J
  • Jacobson, D
  • Kleiman, Rafael
  • Komblit, A
  • Klemens, F
  • Lee, JT-C
  • Mansfield, W
  • Moccio, S
  • Murrell, A
  • O'Malley, M
  • Rosamilia, J
  • Sapjeta, J
  • Silverman, P
  • Sorsch, T
  • Tai, WW
  • Tennant, D
  • Vuong, H
  • Weir, B

publication date

  • January 1, 1997