Thermal evolution of defects produced by implantation of H, D and He in Silicon Conferences

authors

• Simpson, PJ
• Knights, Andrew
• Chicoine, M
• Dudeck, K
• Moutanabbir, O
• Ruffell, S
• Schiettekatte, F
• Terreault, B

status

• published 

publication date

• October 2008

has subject area

• Applied Physics (Science Metrix)

published in

• Applied Surface Science  Journal

presented at event

• 11th Workshop on Slow Position Beam Techniques for Solids and Surfaces  Conference

keywords

• Chemistry
• Chemistry, Physical
• HELIUM
• Materials Science
• Materials Science, Coatings & Films
• Physical Sciences
• Physics
• Physics, Applied
• Physics, Condensed Matter
• SCALE
• SI
• Science & Technology
• Technology
• VOIDS
• blistering
• defects
• ion cutting
• positron annihilation
• silicon

Digital Object Identifier (DOI)

• 10.1016/j.apsusc.2008.05.171

start page

• 63

end page

• 67

volume

• 255

issue

• 1