Characteristics of ultraviolet-assisted pulsed-laser-deposited Y₂O₃ thin films Journal Articles

abstract

• The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 °C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.

authors

• Craciun, V
• Lambers, ES
• Bassim, Nabil
• Singh, RK
• Craciun, D

status

• published 

publication date

• February 2000

has subject area

• 0204 Condensed Matter Physics (FoR)
• 0912 Materials Engineering (FoR)
• 0913 Mechanical Engineering (FoR)
• Materials (Science Metrix)

published in

• Journal of Materials Research  Journal

keywords

• ABLATION
• COATINGS
• GROWTH
• MOLECULAR-BEAM EPITAXY
• Materials Science
• Materials Science, Multidisciplinary
• OXIDE-FILMS
• PHOSPHORS
• SILICON
• Science & Technology
• Technology
• YBA2CU3O7-DELTA

Digital Object Identifier (DOI)

• 10.1557/jmr.2000.0073

start page

• 488

end page

• 494

volume

• 15

issue

• 2