Journal article
Development of a novel tool for semiconductor process control
Abstract
A collaborative project between the Surrey Ion Beam Centre and the positron beam group at the University of Bath is developing a bench-top positron tool suitable for use in the semiconductor industry. The technique's non-destructive nature, coupled with its high sensitivity to defects, makes it a potentially ideal method for detecting process problems at an early stage. Measurements on the existing laboratory-based system have shown, for …
Authors
Gwilliam RM; Knights AP; Wendler E; Sealy BJ; Burrows CP; Coleman PG
Journal
Materials Science and Engineering B, Vol. 80, No. 1-3, pp. 60–64
Publisher
Elsevier
Publication Date
March 2001
DOI
10.1016/s0921-5107(00)00589-4
ISSN
0921-5107