Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers

Selective self‐limited interaction of metal precursors with self‐assembled block copolymer substrates, combined with the unique molecular‐level management of reactions enabled by the atomic layer deposition process, is presented as a promising controllable way to synthesize patterned nanomaterials (e.g., Al2O3 see Figure, TiO2, etc.) with uniform and tunable dimensions.