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Development and characterization of an...
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Development and characterization of an electroplated copper nickel alloy-platinum micro-thermocouple

Abstract

A cost effective electrodeposition technique was developed to microfabricate copper nickel alloy (CuNi)-platinum micro thermocouples. A flat smooth silicon wafer with a 9000 Å layer of oxide was chosen as the substrate material. Gold was used for the thermocouple electroplating base because of its high resistance to electrochemical corrosion and oxidation. Since gold does not adhere to the silicon substrate, a chromium layer was deposited as a …

Authors

Loane S; Selvaganapathy PR; Ching CY

Publication Date

December 1, 2011

Conference proceedings

ASME JSME 2011 8th Thermal Engineering Joint Conference Ajtec 2011