Uniformly spaced λ/4-shifted Bragg grating array with wafer-scale CMOS-compatible process Academic Article uri icon

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abstract

  • We report on an integrated λ/4-shifted Bragg grating array using a wafer-scale complementary metal-oxide semiconductor (CMOS) compatible process with silicon-nitride waveguides. A sidewall grating was used to simplify the fabrication process, and a sampled Bragg grating with equivalent phase-shift structure was employed to achieve an accurate λ/4 phase shift. A four-channel λ/4-shifted Bragg grating array with highly uniform channel spacing was demonstrated with a measured channel spacing variation below 10 pm (1.25 GHz). The high channel-spacing uniformity and the CMOS-compatibility of the demonstrated device hold promise for integrated distributed feedback laser arrays for various silicon photonic applications.

authors

  • Sun, Jie
  • Purnawirman
  • Hosseini, Ehsan Shah
  • Bradley, Jonathan
  • Adam, Thomas N
  • Leake, Gerald
  • Coolbaugh, Douglas
  • Watts, Michael R

publication date

  • October 15, 2013