Conference
The properties of silicon nitride formed through the decomposition of trisdimethylaminosilane in an argon plasma
Authors
Boudreau MG; Brown J; Mascher P
Editors
Besmann TM; Allendorf MD; Robinson M; Ulrich RK
Series
ELECTROCHEMICAL SOCIETY SERIES
Volume
96
Pagination
pp. 464-469
Publisher
ELECTROCHEMICAL SOCIETY INC
Publication Date
January 1, 1996
ISBN-10
1-56677-155-2
Name of conference
13th International Conference on Chemical Vapor Deposition (CVD XIII), at the Electrochemical-Society Meeting
Conference place
LOS ANGELES, CA
Conference start date
May 5, 1996
Conference end date
May 10, 1996
Conference proceedings
PROCEEDINGS OF THE THIRTEENTH INTERNATIONAL CONFERENCE ON CHEMICAL VAPOR DEPOSITION
Issue
5