authors
- Walker, SR
- Davies, JA
- Mascher, Peter
- Wallace, SG
- Lennard, WN
- Massoumi, GR
- Elliman, RG
- Ophel, TR
- Timmers, H
Characterization of silicon oxynitride films using ion beam analysis techniques
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status
publication date
- October 2000
has subject area
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics (FoR)
- 0402 Geochemistry (FoR)
- 0915 Interdisciplinary Engineering (FoR)
- Applied Physics (Science Metrix)