Conference
Compositional and Optical Characterization of SiOx, films deposited by ECR-PECVD for Photonics Applications
Abstract
Thin Thin SiOx films were deposited using ECR-PECVD. The composition and structure of the samples was determined using Rutherford Backscattering and Fourier transform infrared spectroscopy while photoluminescence and ellipsometric measurements were used to characterize the samples optically. AFM measurements confirmed the presence of silicon nanocrystals after annealing the samples. These materials have the potential to be used in a variety of …
Authors
Flynn M; Irving E; Roschuk T; Wojcik J; Mascher P
Pagination
pp. 69-71
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
January 1, 2004
DOI
10.1109/group4.2004.1416656
Name of conference
2004 10th International Workshop on Computational Electronics (IEEE Cat. No.04EX915)