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Focused ion beam implantation-induced disordering in InGaAsP MQW heterostructures [studied by photoluminescence]

Abstract

Results of an investigation of the effects of focused ion beam (FIB) implantation-induced intermixing of an InGaAsP-based multiple quantum well (MQW) structure on the room temperature photoluminescence (PL) are presented. The technique of spatially, spectrally and polarization resolved PL was used to study the process of QWs intermixing by Si/sup +/, Be/sup +/ and B/sup +/. It was found that implantation in a narrow (about 100 nm) line leads to an enhancement of PL yield. A qualitative explanation for this enhancement is given in terms of spatial bandstructure bending due to a doping effect in a narrow region.

Authors

Elenkrig BB; Yang J; Cassidy DT; Bruce DM; Lakshmi B; Champion G

Pagination

pp. 612-615

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

January 1, 1995

DOI

10.1109/iciprm.1995.522218

Name of conference

Seventh International Conference on Indium Phosphide and Related Materials
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