Journal article
Sub-25nm direct write (maskless) X-ray nanolithography
Abstract
Sub-25nm continuous, reproducible features of arbitrary geometry were created by X-ray lithography in direct write (maskless) geometry, analogous to conventional electron beam lithography. This was achieved through the use of a laser interferometer-controlled scanning transmission X-ray microscope (STXM) equipped with a zone doubled Fresnel zone plate lens, and a cold development procedure. These features are among the smallest created with …
Authors
Leontowich AFG; Hitchcock AP; Watts B; Raabe J
Journal
Microelectronic Engineering, Vol. 108, , pp. 5–7
Publisher
Elsevier
Publication Date
8 2013
DOI
10.1016/j.mee.2013.03.006
ISSN
0167-9317