Sub-25nm direct write (maskless) X-ray nanolithography

Sub-25nm continuous, reproducible features of arbitrary geometry were created by X-ray lithography in direct write (maskless) geometry, analogous to conventional electron beam lithography. This was achieved through the use of a laser interferometer-controlled scanning transmission X-ray microscope (STXM) equipped with a zone doubled Fresnel zone plate lens, and a cold development procedure. These features are among the smallest created with photons in direct write geometry.