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The Effect of the Native Oxide on Mask...
Journal article

The Effect of the Native Oxide on Mask Undercutting of V‐Grooves Etched into (100) InP Surfaces Using an SiN x Mask

Abstract

An investigation has been undertaken on the effect of mask undercutting when using chemical etching techniques to produce various V‐groove features on a (100) InP substrate. SiNx masking films were deposited on two types of sample surface. In one case the surface was covered with a naturally occurring oxide; in the other case the oxide was desorbed in a molecular beam epitaxy system and the sample was subsequently transferred in vacuum to an …

Authors

Wang J; Thompson DA; Simmons JG; Boumerzoug M; Boudreau M; Mascher P

Journal

Journal of The Electrochemical Society, Vol. 142, No. 2, pp. 593–596

Publisher

The Electrochemical Society

Publication Date

February 1, 1995

DOI

10.1149/1.2044105

ISSN

0013-4651