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Strained layer (1.5 μm) InP/InGaAsP lasing...
Journal article

Strained layer (1.5 μm) InP/InGaAsP lasing opto-electronic switch (LOES)

Abstract

We present for the first time a lasing opto-electronic switch (LOES) fabricated in the InP/InGaAsP system. In this device the active region is composed of four 63 /spl Aring/ compressively strained quantum wells. A lasing threshold of 104 mA, or 6933 A/cm2, has been observed at a temperature of 298 K, with an external differential quantum efficiency of 14%. The lasing wavelength is centered at 1.52 μm. The current-voltage characteristics …

Authors

Swoger JH; Qiu C; Simmons JG; Thompson DA; Shepherd F; Beckett D; Cleroux M

Journal

IEEE Photonics Technology Letters, Vol. 6, No. 8, pp. 927–929

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

August 1, 1994

DOI

10.1109/68.313054

ISSN

1041-1135