Journal article
Application of in situ ellipsometry in the fabrication of thin-film optical coatings on semiconductors.
Abstract
Thin-film interference filters, suitable for use on GaAs- and InP-based lasers, have been fabricated by use of the electron-cyclotron resonance plasma-enhanced chemical vapor deposition technique. Multilayer film structures composed of silicon oxynitride material have been deposited at low temperatures with an in situ rotating compensator ellipsometer for monitoring the index of refraction and thickness of the deposited layers. Individual …
Authors
Boudreau MG; Wallace SG; Balcaitis G; Murugkar S; Haugen HK; Mascher P
Journal
Applied Optics, Vol. 39, No. 6, pp. 1053–1058
Publisher
Optica Publishing Group
Publication Date
February 20, 2000
DOI
10.1364/ao.39.001053
ISSN
1559-128X