Journal article
Electrical resistivity of sputtered Cu/Cr multilayered thin films
Abstract
Parallel (in-plane) electrical resistivities of single-layered Cu and Cr films, and Cu/Cr multilayered thin films sputter deposited on Si substrates were evaluated as a function of layer thicknesses ranging from 2.5 to 150 nm in the temperature range of 4–325 K. The resistivity of the multilayers at a given temperature increased and residual resistivity ratio decreased with decreasing layer thicknesses. At 300 K, the resistivity of a 1 μm thick …
Authors
Misra A; Hundley MF; Hristova D; Kung H; Mitchell TE; Nastasi M; Embury JD
Journal
Journal of Applied Physics, Vol. 85, No. 1, pp. 302–309
Publisher
AIP Publishing
Publication Date
January 1, 1999
DOI
10.1063/1.369446
ISSN
0021-8979