Boron distribution in the core of Si nanowire grown by chemical vapor deposition

The boron dopant distribution in Si nanowires grown by the Au-catalyzed chemical vapor deposition is characterized by laser-assisted atom probe tomography. A convenient and an effective method for performing the atom probe tomography of an individual nanowire is developed. Using this technique, we demonstrate that when Si nanowires are doped with boron at high silane partial pressure, the radial distribution of boron atoms is rather …