Selective formation of SiC micropatterns by scratching-patterned electrochemical etching

A simple strategy for fabricating SiC microstructures and micropatterns is demonstrated based on scratching-patterned electrochemical etching, where the main processes only include surface scratching with a diamond tip and electrochemical etching using hydrofluoric (HF) acid. The prepared micropatterns were characterized by scanning electron microscopy (SEM) and confocal microscopy to evaluate the surface morphology and microstructures, while atomic force microscopy (AFM) was applied to explore the role of different applied forces. A formation mechanism is proposed by both experimental and simulation analysis through transmission electron microscopy (TEM) and COMSOL modeling, from which a reliable formation mechanism is constructed. In general, this study contributes to extending the microfabrication processes and techniques of SiC, and shows a bright potential in fabrication of microstructures and devices such as optoelectronics and micro-electromechanical systems (MEMS).