(Digital Presentation) Investigation of the Damage of Focus Ion Beam (FIB) on Nanocrystals Formed in Terbium-Doped Silicon Oxide Thin Films

Terbium-doped oxygen-rich silicon oxide (ORSO:Tb) thin films were fabricated using Integrated magnetron sputtering and electron cyclotron plasma-enhanced chemical vapor deposition (IMS ECR-PECVD) method. To investigate damage from focus ion beam (a comparison is made between mechanical and FIB methods measurements, which did not reveal crystal damage induced by FIB. Silicon-based thin films are fundamental materials in electronics and …