Journal article
Structural and Optical Properties of PECVD TiO2–SiO2 Mixed Oxide Films for Optical Applications
Abstract
TiO2–SiO2 mixed oxide films with variable compositions are deposited from oxygen/titanium tetraisopropoxide/hexamethyldisiloxane (HMDSO) inductively coupled radiofrequency plasmas at low temperature and pressure. The related structure, morphology, and optical properties are investigated. Results show that the [Si]/[Ti + Si] concentration ratio in the film is increased sharply from 0 (pure TiO2) to 0.48 by adding a small amount of HMDSO. The …
Authors
Li D; Elisabeth S; Granier A; Carette M; Goullet A; Landesman J
Journal
Plasma Processes and Polymers, Vol. 13, No. 9, pp. 918–928
Publisher
Wiley
Publication Date
9 2016
DOI
10.1002/ppap.201600012
ISSN
1612-8850