Journal article
Formation of Si-nanocrystals in SiO2 via Ion Implantation and Rapid Thermal Processing
Authors
Knights A; Crowe I; Sherliker B; Halsall M; Gwilliam R; Coleman P
Journal
ECS Meeting Abstracts, Vol. MA2009-01, No. 17, pp. 747–747
Publisher
The Electrochemical Society
Publication Date
May 1, 2009
DOI
10.1149/ma2009-01/17/747
ISSN
2151-2043