Journal article
(Invited) Doping Silicon Dielectrics with Silicon, Cerium and Oxygen Via Ion Implantation
Authors
Knights AP; Savidge RM; Halsall MP; Crowe IF
Journal
ECS Meeting Abstracts, Vol. MA2013-01, No. 18, pp. 793–793
Publisher
The Electrochemical Society
Publication Date
March 8, 2013
DOI
10.1149/ma2013-01/18/793
ISSN
2151-2043