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Electrical Stressing Induced Monolayer Vacancy...
Journal article

Electrical Stressing Induced Monolayer Vacancy Island Growth on TiSe2

Abstract

To ensure practical applications of atomically thin transition metal dichalcogenides, it is essential to characterize their structural stability under external stimuli such as electric fields and currents. Using vacancy monolayer islands on TiSe2 surfaces as a model system, we have observed nonlinear area evolution and growth from triangular to hexagonal driven by scanning tunneling microscopy (STM) subjected electrical stressing. The observed …

Authors

Zheng H; Valtierra S; Ofori-Opoku N; Chen C; Sun L; Yuan S; Jiao L; Bevan KH; Tao C

Journal

Nano Letters, Vol. 18, No. 3, pp. 2179–2185

Publisher

American Chemical Society (ACS)

Publication Date

March 14, 2018

DOI

10.1021/acs.nanolett.8b00515

ISSN

1530-6984