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Properties of Si Nanocrystals Formed in...
Journal article

Properties of Si Nanocrystals Formed in Inductively Coupled Plasma CVD Grown SiOx Thin Films

Authors

Roschuk T; Comedi D; Zalloum O; Wojcik J; Chelomentsev E; Flynn M; Mascher P

Journal

ECS Meeting Abstracts, Vol. MA2006-01, No. 8, pp. 364–364

Publisher

The Electrochemical Society

Publication Date

February 17, 2006

DOI

10.1149/ma2006-01/8/364

ISSN

2151-2043