Journal article
PECVD Silicon Nitride-Based Multilayers with Optimized Mechanical Properties
Abstract
Silicon nitride (SiN) based films deposited by plasma-enhanced chemical vapor deposition (PECVD) have interesting optical, mechanical, and chemical properties. They are used for applications such as anti-reflective coatings and surface passivation layers in solar cells. Amorphous SiN-based films also are frequently used to create multilayer structures of alternatingly high-index and low-index films. This approach is very promising to fabricate …
Authors
Ahammou B; Bhattacharyya P; Azmi F; Levallois C; Landesman J-P; Mascher P
Journal
ECS Meeting Abstracts, Vol. MA2022-01, No. 19, pp. 1052–1052
Publisher
The Electrochemical Society
Publication Date
July 7, 2022
DOI
10.1149/ma2022-01191052mtgabs
ISSN
2151-2043