Journal article
Atom-by-Atom Analysis of Rare-Earth Dopants implanted in Silicon
Abstract
Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.
Authors
Couillard M; Radtke G; Knights A; Botton G
Journal
Microscopy and Microanalysis, Vol. 16, No. S2, pp. 90–91
Publisher
Oxford University Press (OUP)
Publication Date
July 2010
DOI
10.1017/s1431927610060885
ISSN
1431-9276