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Modeling metallic island coalescence stress via...
Journal article

Modeling metallic island coalescence stress via adhesive contact between surfaces

Abstract

Tensile stress generation associated with island coalescence is almost universally observed in thin films that grow via the Volmer-Weber mode. The commonly accepted mechanism for the origin of this tensile stress is a process driven by the reduction in surface energy at the expense of the strain energy associated with the deformation of coalescing islands during grain boundary formation. In the present work, we have performed molecular statics …

Authors

Seel SC; Hoyt JJ; Webb EB; Zimmerman JA

Journal

Physical Review B, Vol. 73, No. 24,

Publisher

American Physical Society (APS)

Publication Date

June 15, 2006

DOI

10.1103/physrevb.73.245402

ISSN

2469-9950