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Amorphous Indium Gallium Zinc Oxide Thin-Film...
Journal article

Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors with a Low-Temperature Polymeric Gate Dielectric on a Flexible Substrate

Abstract

Amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) with a solution-processed polymeric gate dielectric of cross-linked poly(4-vinylphenol) (c-PVP) film were fabricated on a poly(ethylene terephthalate) (PET) substrate on which an a-IGZO film, as the active channel layer, was deposited by radio frequency (RF) sputtering. The entire TFT fabrication process was carried out at a temperature below 110 °C. The device exhibited …

Authors

Hyung GW; Park J; Wang J-X; Lee HW; Li Z-H; Koo J-R; Kwon SJ; Cho E-S; Kim WY; Kim YK

Journal

Japanese Journal of Applied Physics, Vol. 52, No. 7R,

Publisher

IOP Publishing

Publication Date

July 1, 2013

DOI

10.7567/jjap.52.071102

ISSN

0021-4922