Degradation of boscalid, pyraclostrobin, fenbuconazole, and glyphosate residues by an advanced oxidative process utilizing ultraviolet light and hydrogen peroxide

Recently an advanced oxidative process (AOP) combining H2O2 and UV-C light was observed to be effective at controlling Listeria monocytogens and Escherichia coli O157:H7 and degrading chlorpyrifos residues on the surface of apples. Little is known about the application of AOP for the degradation of other pesticide residues. This study examined degradation of boscalid, pyraclostrobin, fenbuconazole and glyphosate by 3% (w/v) H2O2, UV-C (254 nm) …