New technique for in‐situ measurement of backscattered and secondary electron yields for the calculation of signal‐to‐noise ratio in a SEM

The quality of an image generated by a scanning electron microscope is dependent on secondary emission, which is a strong function of surface condition. Thus, empirical formulae and available databases are unable to take into account actual metrology conditions. This paper introduces a simple and reliable measurement technique to measure secondary electron yield (delta) and backscattered electron yield (eta) that is suitable for in-situ …