Journal article
Effect of deposition conditions on the chemical bonding in sputtered carbon nitride films
Abstract
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride films from a graphite target under various conditions. Sample temperature, bias voltage and nitrogen content in the gas mixture were varied. The effects of oxygen, methane and ammonia on the film growth were also studied. Special attention was paid to the effects of the deposition parameters on the structure of the films, in particular the …
Authors
Axén N; Botton GA; Somekh RE; Hutchings IM
Journal
Diamond and Related Materials, Vol. 5, No. 2, pp. 163–168
Publisher
Elsevier
Publication Date
3 1996
DOI
10.1016/0925-9635(95)00343-6
ISSN
0925-9635