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ATTEMPTS TO REDUCE THE OXYGEN OVERPOTENTIAL OF Ni...
Chapter

ATTEMPTS TO REDUCE THE OXYGEN OVERPOTENTIAL OF Ni ANODES USING ION BEAM MIXING AND ION IMPLANTATION TECHNIQUES

Abstract

Ni electrodes have been prepared with evaporated surface layers of Ru, Rh, Pd, Ag, Ir and Pt. These are subjected to 80 keV Ar+ bombardment for fluences ranging from 1-6×1016 cm-2. Ni electrodes have also been prepared by direct ion implantation of 50 keV Ru+, Rh+, Pd+, Ag+, Ir+ and Pt+ over the fluence range 0.5-2×1016 cm-2. The distributions of the impurity metals in the Ni are determined by backscattering (RBS) before and after …

Authors

Thompson DA; Akano U; Davies JA; Smeltzer WW

Book title

Ion Implantation Into Metals

Pagination

pp. 46-54

Publisher

Elsevier

Publication Date

1982

DOI

10.1016/b978-0-08-027625-0.50010-1