Chapter
ATTEMPTS TO REDUCE THE OXYGEN OVERPOTENTIAL OF Ni ANODES USING ION BEAM MIXING AND ION IMPLANTATION TECHNIQUES
Abstract
Ni electrodes have been prepared with evaporated surface layers of Ru, Rh, Pd, Ag, Ir and Pt. These are subjected to 80 keV Ar+ bombardment for fluences ranging from 1-6×1016 cm-2. Ni electrodes have also been prepared by direct ion implantation of 50 keV Ru+, Rh+, Pd+, Ag+, Ir+ and Pt+ over the fluence range 0.5-2×1016 cm-2. The distributions of the impurity metals in the Ni are determined by backscattering (RBS) before and after …
Authors
Thompson DA; Akano U; Davies JA; Smeltzer WW
Book title
Ion Implantation Into Metals
Pagination
pp. 46-54
Publisher
Elsevier
Publication Date
1982
DOI
10.1016/b978-0-08-027625-0.50010-1