Experts has a new look! Let us know what you think of the updates.

Provide feedback
Home
Scholarly Works
Plasmon-Induced Heterointerface Thinning for...
Journal article

Plasmon-Induced Heterointerface Thinning for Schottky Barrier Modification of Core/Shell SiC/SiO2 Nanowires

Abstract

In this work, plasmon-induced heterointerface thinning for Schottky barrier modification of core/shell SiC/SiO2 nanowires is conducted by femtosecond (fs) laser irradiation. The incident energy of polarized fs laser (50 fs, 800 nm) is confined in the SiO2 shell of the nanowire due to strong plasmonic localization in the region of the electrode-nanowire junction. With intense nonlinear absorption in SiO2, the thickness of the SiO2 layer can be …

Authors

Xing S; Lin L; Huo J; Zou G; Sheng X; Liu L; Zhou YN

Journal

ACS Applied Materials & Interfaces, Vol. 11, No. 9, pp. 9326–9332

Publisher

American Chemical Society (ACS)

Publication Date

March 6, 2019

DOI

10.1021/acsami.8b20860

ISSN

1944-8244