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InSb nanowires for multispectral infrared...
Journal article

InSb nanowires for multispectral infrared detection

Abstract

InSb nanowire (NW) arrays fabricated by a top-down etching process were investigated for multispectral infrared photodetection. A 2.5 μm thick film of InSb was grown on Si (100) by molecular beam epitaxy using an AlSb buffer layer to alleviate defects associated with lattice mismatch strain, as confirmed by scanning electron microscopy and x-ray diffraction. Using a Ti mask patterned by electron beam lithography, InSb NW arrays with diameters …

Authors

Goosney CJ; Jarvis VM; Wilson DP; Goktas NI; LaPierre RR

Journal

Semiconductor Science and Technology, Vol. 34, No. 3,

Publisher

IOP Publishing

Publication Date

March 1, 2019

DOI

10.1088/1361-6641/ab0476

ISSN

0268-1242